HS-22620RH
Die Characteristics
DIE DIMENSIONS:
145 mils x 116 mils x 19 mils ±1 mil
3670µm x 2950µm x 483µm ±25.4µm
INTERFACE MATERIALS:
Glassivation:
Type: Nitride (S13N4) over Silox (SIO2, 5% Phos.)
Silox Thickness: 12kÅ ±2kÅ
Nitride Thickness: 3.5kÅ ±1.5kÅ
Top Metallization:
Type: Al, 1% Cu
Thickness: 14kÅ ±2kÅ
Substrate:
Bipolar Bonded Wafer (EBHF)
Backside Finish:
Silicon
ASSEMBLY RELATED INFORMATION:
Substrate Potential (Powered Up):
Unbiased Silicon
(WEB pad provided for substrate tie-off.)
ADDITIONAL INFORMATION:
Worst Case Current Density:
<2 x 105 A/cm2
Transistor Count:
184
Metallization Mask Layout
HS-22620RH
BAL1A
(2)
BAL2A
(1)
VCCA
(18)
VEEA
(17)
+INA (3)
(16) OUTA
-INA (4)
-INB (6)
(15) COMPA
(14) WEB
(13) COMPB
+INB (7)
(8)
BAL1B
(9)
BAL2B
4
(10)
VCCB
(12) OUTB
(11)
VEEB