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CP229 Даташит - Central Semiconductor

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CP229

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37.7 kB

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Central-Semiconductor
Central Semiconductor 

PROCESS DETAILS

   Process EPITAXIAL PLANAR
   Die Size 21.7 x 21.7 MILS
   Die Thickness 8.7 MILS
   Base Bonding Pad Area 3.2 MILS Diameter
   Emitter Bonding Pad Area 3.4 x 3.4 MILS
   Top Side Metalization Al - 10,000Å
   Back Side Metalization Au - 10,000Å


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