CP219(2010) データシート - Central Semiconductor
メーカー

Central Semiconductor
PROCESS DETAILS
Process EPITAXIAL PLANAR
Die Size 83 x 83 MILS
Die Thickness 11 MILS
Base Bonding Pad Area 13.2 x 19.7 MILS
Emitter Bonding Pad Area 13.2 x 21.2 MILS
Top Side Metalization Al - 30,000Å
Back Side Metalization Au - 12,000Å
Power Transistor NPN - High Current Transistor Chip
Central Semiconductor
Power Transistors NPN - High Current Transistor Chip ( Rev : 2006 )
Central Semiconductor
Power Transistors NPN - High Current Transistor Chip
Central Semiconductor
Power Transistor PNP - High Current Transistor Chip
Central Semiconductor
Small Signal Transistor NPN - High Current Transistor Chip ( Rev : 2002 )
Central Semiconductor
Small Signal Transistor NPN - High Current Transistor Chip
Central Semiconductor
Small Signal Transistor NPN - High Current Transistor Chip ( Rev : 2002 )
Central Semiconductor
Small Signal Transistor NPN - High Current Transistor Chip
Central Semiconductor
Small Signal Transistor NPN - High Current Transistor Chip
Central Semiconductor
Small Signal Transistor NPN - High Current Transistor Chip
Central Semiconductor